Design and constant force control of a parallel polishing machine

Bing Li, Guotao Li, Weiyang Lin, P. Xu
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引用次数: 10

Abstract

In order to improve the low efficiency, poor product consistency and cruel working environment of current manual polishing method, a parallel polishing machine is presented. First, based on the freeform surface polishing requirement, a scheme of the automatic polishing machine is proposed, which includes a five-DOF parallel manipulator, a single DOF rotary table and a linear motion platform with a force feedback system. Next, a polishing force control model of the linear motion platform is established. Fractional order PIλDμ control method is introduced to achieve force-displacement hybrid control. Finally, the parallel polishing machine is developed and a constant force polishing experiment is conducted. The experimental results display that parallel polishing machine is capable of improving the roughness of the surface of the manufactured part from level 9 precision to level 11 precision.
平行抛光机的设计与恒力控制
针对目前手工抛光效率低、产品一致性差、工作环境恶劣等问题,提出了一种并联抛光机。首先,根据自由曲面抛光的要求,提出了一种自动抛光机的方案,该方案包括五自由度并联机械手、单自由度转台和带力反馈系统的直线运动平台。其次,建立了直线运动平台的抛光力控制模型。引入分数阶pi - λ dμ控制方法,实现力-位移混合控制。最后,研制了并联抛光机,并进行了恒力抛光实验。实验结果表明,平行抛光机能够将被加工零件的表面粗糙度从9级精度提高到11级精度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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