Y. Igaku, S. Matsui, H. Ishigaki, H. Hiroshima, M. Komuro, S. Yamanaka, T. Nagamura
{"title":"Compact imprint system using driving power of stepping motor","authors":"Y. Igaku, S. Matsui, H. Ishigaki, H. Hiroshima, M. Komuro, S. Yamanaka, T. Nagamura","doi":"10.1109/IMNC.2000.872697","DOIUrl":null,"url":null,"abstract":"In this paper, we report on a newly developed step-and-repeat nano-imprint-lithography (NIL) system using driving power of stepping motor which has advantages that the system size is small and the precise control is possible by using a stepping motor instead of a hydraulic press. We have developed a compact imprint lithography system and demonstrated replication of 1 /spl mu/m patterns as preliminary experiment. Nanometer patterns and details of several key operating parameters will be discussed.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"70 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.2000.872697","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
In this paper, we report on a newly developed step-and-repeat nano-imprint-lithography (NIL) system using driving power of stepping motor which has advantages that the system size is small and the precise control is possible by using a stepping motor instead of a hydraulic press. We have developed a compact imprint lithography system and demonstrated replication of 1 /spl mu/m patterns as preliminary experiment. Nanometer patterns and details of several key operating parameters will be discussed.