Automatic parameter control system for semiconductor structures manufacturing

Abstract

This paper describes analysis of measurement equipment design concepts and some advances in our research regarding the construction of computer based facilities for electrical and non-electrical complex parameters measurements of semiconductor structures. CV- and GV-characteristics system has been designed and used for automatic parameter control of semiconductors production particularly for technological process control of the charge-coupled CCD device manufacturing. The proposed measuring system has been analyzed to estimate performance of semiconductor characteristics acquisition and processing. That information is used as a feedback action to improve a technological process of the CCD structure manufacturing.