DMG insulated shallow extension cylindrical GAA Schottky Barrier MOSFET for removal of ambipolarity: A novel approach

M. Kumar, Yogesh Pratap, Mridula Gupta, S. Haldar, R. Gupta
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引用次数: 0

Abstract

This paper proposes a novel Dual Metal Gate (DMG) Insulated Shallow Extension (ISE) Cylindrical Gate All Around (CGAA) Schottky Barrier (SB) MOSFET to eliminate the ambipolar behaviour of SB-CGAA MOSFET by blocking the metal induced gap states as well as unwanted charge sharing between source/channel and drain/channel regions. The Ion/Ioff ratio of DMG-ISE-CGAA-SB MOSFET increases by 362 times offering steeper subthreshold slope (67.59 mV/decade) and improved cut-off frequency makes it attractive candidate for CMOS digital circuit design.
用于去除双极性的DMG绝缘浅延伸圆柱形GAA肖特基势垒MOSFET:一种新方法
本文提出了一种新的双金属栅极(DMG)绝缘浅扩展(ISE)圆柱栅极(CGAA)肖特基势垒(SB) MOSFET,通过阻断金属诱导的间隙状态以及源/沟道和漏极/沟道区域之间不必要的电荷共享来消除SB-CGAA MOSFET的双极性行为。dmg - se - cgaa - sb MOSFET的离子/开关比提高了362倍,提供了更陡的亚阈值斜率(67.59 mV/十进)和更高的截止频率,使其成为CMOS数字电路设计的有吸引力的候选者。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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