X-ray characterization of PbSe/Si layers grown by pulsed laser ablation method

Abstract

PbSe thin layers were grown by pulsed laser deposition. The layers were obtained on Si substrates at temperature 45K to 650K. The structure of the layers and its lattice parameters were estimated from the X-ray diffraction measurements. The strong intensity of (200)-PbSe peak indicates a self-texture preference in the c-axis direction.