Synchrotron radiation micro lithography and etching (SMILE) for MEMS fabrication

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) Pub Date : 2001-10-31 DOI:10.1109/IMNC.2001.984190

S. Sugiyama

引用次数: 6

Abstract

High aspect ratio microstructure technology (HARMST) is an important technology in order to realize 3-D MEMS. Fine scale HARMST enables processing on a sub-micron scale. If this process is made practicable, application of MEMS can be extended to the optical wavelength region. We are studying two approaches of HARMST using synchrotron radiation microlithography and etching (SMILE) techniques.

查看原文本刊更多论文

用于MEMS制造的同步辐射微光刻和蚀刻(SMILE)

高纵横比微结构技术是实现三维微机电系统的一项重要技术。精细尺度HARMST能够在亚微米尺度上进行加工。如果该工艺可行，MEMS的应用可以扩展到光波长区域。我们正在研究同步辐射微光刻和蚀刻(SMILE)技术的两种方法。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)

自引率

0.00%

发文量