High-Speed PLZT Optical Switches

O. Yamazaki, K. Wasa, T. Kawaguchi, Y. Manabe, H. Adachi, H. Higashino, K. Setsune
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Abstract

PLZT [(Pb,La)(Zr,Ti)O3] thin film is one of the most promising materials for optical integrated circuits. The PLZT films have potential for their stronger electrooptic effect than conventional Ti-diffused LiNbO3 and for monolithic integration with other active devices fabricated on a same substrate. Several workers have tried to prepare PLZT films of optical quality1,2). Using an rf-planar magnetron sputtering system, we succeeded in epitaxial growth of PLZT single crystal film on sapphire from PLZT(28/0/100) target and confirmed an electrooptic effect of the film3). Basic operation of optical switches have been also confirmed4). In this paper, we report high frequency operation, optical damage of the PLZT switches and propose a butt-coupling technique in a layered structure.
高速PLZT光开关
PLZT [(Pb,La)(Zr,Ti)O3]薄膜是光学集成电路中最有前途的材料之一。与传统的ti扩散LiNbO3相比,PLZT薄膜具有更强的电光效应,并且可以与在同一衬底上制造的其他有源器件进行单片集成。一些工作者已经尝试制备光学质量的PLZT薄膜(1,2)。利用射频平面磁控溅射系统,我们成功地从PLZT(28/0/100)靶材在蓝宝石上外延生长了PLZT单晶薄膜,并证实了薄膜的电光效应。光开关的基本操作也得到了证实。在本文中,我们报道了PLZT开关的高频工作和光学损伤,并提出了一种层状结构的对接耦合技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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