Exploring the design space for resistive nonvolatile memory crossbar arrays with mixed ionic-electronic-conduction (MIEC)-based Access Devices

P. Narayanan, G. Burr, R. Shenoy, S. Stephens, K. Virwani, A. Padilla, B. Kurdi, K. Gopalakrishnan
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引用次数: 6

Abstract

Using circuit-level SPICE simulations, we explore the design constraints on crossbar arrays composed of a nonvolatile memory (NVM) (+1R) and a highly nonlinear Access Device (AD) enabled by Cu-containing Mixed Ionic-Electronic Conduction (MIEC) materials [1-5]. Such ADs must maintain ultra-low leakage through a large number of unselected and partially selected 1AD+1R cells, while delivering high currents to the few cells selected for either read or write. We show that power consumption during write, not read margin, is the most stringent constraint for large 1AD+1R crossbar arrays, with NVM switching voltage VNVM and selector voltage margin Vm being much more critical than write current. We show that scaled MIEC devices (Vm ~ 1.54V [4]) can support 1Mb arrays for VNVM up to 1.2V. Stacking two MIEC devices enables VNVM ~ 2.4V. A 20% improvement in Vm can either enable a 4× increase in array size or counteract a 5× increase in interconnect line resistance.
探索基于混合离子-电子传导(MIEC)接入器件的电阻性非易失性存储器交叉棒阵列的设计空间
通过电路级SPICE模拟,我们探索了由非易失性存储器(NVM) (+1R)和含cu混合离子电子传导(MIEC)材料实现的高度非线性访问器件(AD)组成的交叉棒阵列的设计约束[1-5]。这种ad必须通过大量未选择和部分选择的1AD+1R电池保持超低漏电流,同时为少数被选择用于读或写的电池提供高电流。我们表明,对于大型1AD+1R交叉棒阵列,写入期间的功耗,而不是读取余量,是最严格的约束,其中NVM开关电压VNVM和选择器电压余量Vm比写入电流更为关键。我们证明了缩放后的MIEC器件(Vm ~ 1.54V[4])可以支持1Mb的VNVM阵列,最高可达1.2V。两台MIEC设备堆叠,支持VNVM ~ 2.4V。Vm的20%改进可以使阵列大小增加4倍或抵消互连线电阻增加5倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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