C. Pacha, K. von Arnim, F. Bauer, T. Schulz, W. Xiong, K. T. San, A. Marshall, T. Baumann, C. Cleavelin, K. Schruefer, J. Berthold
{"title":"Efficiency of low-power design techniques in Multi-Gate FET CMOS Circuits","authors":"C. Pacha, K. von Arnim, F. Bauer, T. Schulz, W. Xiong, K. T. San, A. Marshall, T. Baumann, C. Cleavelin, K. Schruefer, J. Berthold","doi":"10.1109/ESSDERC.2007.4430891","DOIUrl":null,"url":null,"abstract":"Energy dissipation, performance, and voltage scaling of Multi-Gate FET (MuGFET) based CMOS circuits are analyzed using product-representative test circuits composed of 10 k devices. The circuits are fabricated in a low power MuGFET CMOS technology, achieve clock frequencies of 370-500MHz at VDD=1.2V, and operate down to the subthreshold region. Voltage scalability of MuGFET circuits is superior to sub-100 nm planar CMOS circuits due to excellent short-channel effect control.","PeriodicalId":121828,"journal":{"name":"ESSCIRC 2007 - 33rd European Solid-State Circuits Conference","volume":"55 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ESSCIRC 2007 - 33rd European Solid-State Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDERC.2007.4430891","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 11
Abstract
Energy dissipation, performance, and voltage scaling of Multi-Gate FET (MuGFET) based CMOS circuits are analyzed using product-representative test circuits composed of 10 k devices. The circuits are fabricated in a low power MuGFET CMOS technology, achieve clock frequencies of 370-500MHz at VDD=1.2V, and operate down to the subthreshold region. Voltage scalability of MuGFET circuits is superior to sub-100 nm planar CMOS circuits due to excellent short-channel effect control.