Interconnect and noise modeling - Session 24

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Abstract

As semiconductor technologies continue to scale down, new challenges have surfaced in the areas of timing closure and noise coupling. As technologies continue to push the metal spacings to fulfill the insatiable appetite for increased chip density, the interconnects themselves have become performance limitators due to attenuation, crosstalk, and dispersion. At the same time, market requirements are driving chip designers to combine noisesensitive analog circuits with high-speed, noise-generating digital circuits. The papers in this session address these problems by presenting inductance and capacitance extraction methods, interconnect modeling, noise coupling, and dynamic power integrity analysis.
互连和噪声建模-第24节
随着半导体技术的不断缩小,时序闭合和噪声耦合领域出现了新的挑战。随着技术不断推动金属间距以满足对增加芯片密度的无止境的需求,互连本身由于衰减,串扰和色散而成为性能限制因素。与此同时,市场需求正在推动芯片设计者将噪声敏感的模拟电路与高速、产生噪声的数字电路相结合。本次会议的论文通过介绍电感和电容提取方法、互连建模、噪声耦合和动态功率完整性分析来解决这些问题。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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