Charge effects in dielectric films of MIS structures being under high-field injection of electrons at ionizing radiation

V. Andreev, V. Maslovsky, D. Andreev, A. Stolyarov
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引用次数: 5

Abstract

In this work we study influence of α-particles and gamma-ray onto MIS structures being under high-field FowlerNordheim injections of electrons into the gate dielectric. We discover that ionizing current occurring at the time of radiation of MIS structures being under high-field injection of electrons by constant current can significantly lower density of injection current and decrease electric field in the dielectric film. We demonstrate that from analysis of time dependency of voltage across MIS structure at the time of constant current flowing we can determine a value of ionization current. The effect can be utilized for sensors of radiations which allow to control both intensity of radiation and a value of integral absorbed dose of ionizing radiation. We develop a model describing processes of change of charge state of MIS structures being under high-field injection at radiation influence. This model takes into account an interaction of injected electrons with products occurring in the dielectric film as a result of ionization radiation.
电离辐射下高场电子注入下MIS结构介电膜中的电荷效应
本文研究了高场fowler - nordheim电子注入栅极电介质时α-粒子和γ射线对MIS结构的影响。研究发现,在恒定电流高场注入下,MIS结构辐射时产生的电离电流可以显著降低注入电流密度,减小介电膜中的电场。我们证明,通过分析恒流时MIS结构上电压的时间依赖性,我们可以确定电离电流的值。该效应可用于控制辐射强度和电离辐射积分吸收剂量值的辐射传感器。我们建立了一个描述高场注入辐射影响下MIS结构电荷态变化过程的模型。该模型考虑了由于电离辐射而在介电膜中产生的注入电子与产物的相互作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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