Manufacturing of 3D integrated sensors and circuits

M. Schrems, J. Siegert, Peter Dorfi, J. Kraft, E. Stueckler, F. Schrank, S. Selberherr
{"title":"Manufacturing of 3D integrated sensors and circuits","authors":"M. Schrems, J. Siegert, Peter Dorfi, J. Kraft, E. Stueckler, F. Schrank, S. Selberherr","doi":"10.1109/ESSDERC.2014.6948785","DOIUrl":null,"url":null,"abstract":"3D integration of functions such as sensors and circuit elements enables miniaturized and cost-effective smart systems. Wirebonds are replaced by Through Silicon Vias (TSVs) and Wafer Level Packaging (WLP) for shorter conductive paths and reduced form factor. This paper reviews prior art and presents a comprehensive set of data from volume manufacturing of 3D integrated optical sensors and circuits using a “via last” manufacturing flow. 3D specific yield detracting processes such as patterning of open TSVs, wafer bonding, and etching are analyzed and discussed. Functional test yields equivalent to standard CMOS process yields can be achieved.","PeriodicalId":262652,"journal":{"name":"2014 44th European Solid State Device Research Conference (ESSDERC)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 44th European Solid State Device Research Conference (ESSDERC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDERC.2014.6948785","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

3D integration of functions such as sensors and circuit elements enables miniaturized and cost-effective smart systems. Wirebonds are replaced by Through Silicon Vias (TSVs) and Wafer Level Packaging (WLP) for shorter conductive paths and reduced form factor. This paper reviews prior art and presents a comprehensive set of data from volume manufacturing of 3D integrated optical sensors and circuits using a “via last” manufacturing flow. 3D specific yield detracting processes such as patterning of open TSVs, wafer bonding, and etching are analyzed and discussed. Functional test yields equivalent to standard CMOS process yields can be achieved.
3D集成传感器和电路制造
传感器和电路元件等功能的3D集成使小型化和具有成本效益的智能系统成为可能。线键被硅通孔(tsv)和晶圆级封装(WLP)所取代,以缩短导电路径和减小外形尺寸。本文回顾了现有技术,并提出了一套全面的数据,从批量生产的3D集成光学传感器和电路使用“通过最后”的制造流程。分析和讨论了三维特定的良率减损工艺,如开放式tsv的图像化、晶圆键合和蚀刻。功能测试产率相当于标准CMOS工艺产率可以实现。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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