Analysis of 1/f Noise for Organic TFTs Considering Mobility Power-Law Parameter

Hongyu He, Yuan Liu, Hao Wang, Xinnan Lin, Xueren Zheng, Shengdong Zhang
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Abstract

Based on carrier number fluctuation model, $1/f$ noise is analyzed for organic thin-film transistors (TFTs) at low drain voltage. The carrier mobility is gate-voltage-dependent, and is described by a power-law function. The mobility power-law parameter $\alpha $ determines the relationship between drain current noise power spectral density (PSD) $S_{I_{\mathrm {D}\mathrm {S}}}$ and drain current $I_{\mathrm {D}\mathrm {S}}$, and it is found that $S_{I_{\mathrm {D}\mathrm {S}}}/I_{\mathrm {D}\mathrm {S}}^{2} \propto I_{\mathrm {D}\mathrm {S}}^{-1}$ when $\alpha = 1$. It is different from the well-known rule for the MOSFETs with the constant carrier mobility: When $S_{I_{\mathrm {D}\mathrm {S}}}/I_{\mathrm {D}\mathrm {S}}^{2} \propto I_{\mathrm {D}\mathrm {S}}^{-1}$, Hooge’s mobility fluctuation model dominates the $1/f$ noise.
考虑迁移率幂律参数的有机TFTs 1/f噪声分析
基于载流子数波动模型,分析了低漏极电压下有机薄膜晶体管的$1/f$噪声。载流子迁移率与门电压有关,并由幂律函数描述。迁移率幂律参数$\alpha $决定了漏极电流噪声功率谱密度(PSD) $S_{I_{\mathrm {D}\mathrm {S}}}$与漏极电流$I_{\mathrm {D}\mathrm {S}}$之间的关系,发现$S_{I_{\mathrm {D}\mathrm {S}}}/I_{\mathrm {D}\mathrm {S}}^{2} \propto I_{\mathrm {D}\mathrm {S}}^{-1}$当$\alpha = 1$。这与众所周知的载流子迁移率恒定的mosfet的规则不同:当$S_{I_{\mathrm {D}\mathrm {S}}}/I_{\mathrm {D}\mathrm {S}}^{2} \propto I_{\mathrm {D}\mathrm {S}}^{-1}$时,Hooge的迁移率波动模型支配$1/f$噪声。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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