Influence of Na2Si2O5 on the Hydration of C4AF with Various Surface Areas

Kwang-suk You, H. Fujimori, K. Ioku, S. Goto
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引用次数: 1

Abstract

The hydration of C 4 AF having various surface areas was investigated with Na 2 Si 2 O 5 solution. The hydration behavior of C 4 AF depended on the amount of silicate ions precipitated on its surface. The amount of precipitated silicate ions, which hindered the hydration of C 4 AF, was proportional to the surface area of C 4 AF. The precipitated silicate ions on the surface of C 4 AF were founded to be a silica-like material by means of X-ray photoelectron spectroscopy (XPS). They formed a layer approximately 3 nm thick on the surface of C 4 AF.
Na2Si2O5对不同表面积C4AF水化的影响
研究了不同表面积的c4 - AF在na2si2o5溶液中的水化反应。c4af的水化行为取决于其表面沉淀的硅酸盐离子的数量。硅酸盐离子的析出量与c4 - AF的表面积成正比,阻碍了c4 - AF的水化作用。通过x射线光电子能谱(XPS)分析,发现c4 - AF表面析出的硅酸盐离子为类硅材料。它们在c4 AF表面形成了约3nm厚的层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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