Effect of Nitride Stress on Linearity performance of AlGaN/GaN HEMT

Abstract

Strain engineering has proved to be useful for enhancing the performance of AlGaN/GaN HEMT devices. The device transfer characteristics are significantly affected by proper optimization of the stress in the nitride passivation layer. Nonlinearity effects are the major concern for AlGaN/GaN HEMT devices at high frequencies which can vary due to the intrinsic stress in the nitride passivation layer. In this paper for the first time, we have reported the effect of stress on the linearity of the device. With LG =200nm the linearity parameter like gm1, gm2, gm3, VIP2, VIP3 and IIP3 are compared for no stress, comparative stress and tensile stress device.