Shulan Jiang, T. Shi, Hu Long, S. Xi, Hu Hao, Siyi Cheng, Zirong Tang
{"title":"Fabrication of 3D carbon structures based on C-MEMS technique (invited speaker)","authors":"Shulan Jiang, T. Shi, Hu Long, S. Xi, Hu Hao, Siyi Cheng, Zirong Tang","doi":"10.1109/CSTIC.2015.7153349","DOIUrl":null,"url":null,"abstract":"Facile and low-cost strategies are devised for large-scale manufacturing of three-dimensional (3D) large surface area and high-aspect-ratio carbon structures using UV photolithography process along with pyrolysis process. Moreover, combined with self-assembly process, oxygen plasma etching process, film sputtering process, or electrochemically deposition process, various 3D large surface area carbon structures are obtained, including suspended glassy-like carbon microelectrodes, nanowrinkles integrated carbon microstructures, micro/nano dual-scale carbon array, etc. These large surface area carbon structures show great potentials in the fields of chemical and biological sensors, surface-enhanced Raman scattering, and energy storage devices such as micro-supercapacitors, micro-batteries and fuel cells. This paper provides an overview of our research on large-scale fabrication of 3D large surface area carbon structures.","PeriodicalId":130108,"journal":{"name":"2015 China Semiconductor Technology International Conference","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 China Semiconductor Technology International Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSTIC.2015.7153349","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Facile and low-cost strategies are devised for large-scale manufacturing of three-dimensional (3D) large surface area and high-aspect-ratio carbon structures using UV photolithography process along with pyrolysis process. Moreover, combined with self-assembly process, oxygen plasma etching process, film sputtering process, or electrochemically deposition process, various 3D large surface area carbon structures are obtained, including suspended glassy-like carbon microelectrodes, nanowrinkles integrated carbon microstructures, micro/nano dual-scale carbon array, etc. These large surface area carbon structures show great potentials in the fields of chemical and biological sensors, surface-enhanced Raman scattering, and energy storage devices such as micro-supercapacitors, micro-batteries and fuel cells. This paper provides an overview of our research on large-scale fabrication of 3D large surface area carbon structures.