Improved Near-infrared Photoresponse of Si-based Schottky Diode by Nanophotonic Structures

H. Wen, L. Augel, J. Knobbe
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引用次数: 1

Abstract

Schottky photodetectors based on internal photoemission enable the detection of infrared radiation beyond the spectral range of silicon pin diodes. Major drawbacks for many applications are the low quantum efficiency and the dark current. Among all approaches to solving these issues, this work focuses on nanophotonic structures to reduce the reflection of the device. We present a backside-illuminated AlSiCu/Si Schottky photodetector with nanopyramids in various sizes produced with a full CMOS compatible process. We found a Schottky barrier height of 0.59 eV while keeping dark current density low (under $1 A\cdot m^{-2}$ at 293 K) and we were able to show an improvement in optical responsivity by a factor of more than seven within the wavelength range from 1300 nm to 1600 nm compared to planar devices.
利用纳米光子结构改进硅基肖特基二极管的近红外光响应
基于内部光电发射的肖特基光电探测器能够探测超出硅引脚二极管光谱范围的红外辐射。许多应用的主要缺点是低量子效率和暗电流。在解决这些问题的所有方法中,这项工作的重点是纳米光子结构,以减少设备的反射。我们提出了一种背照AlSiCu/Si肖特基光电探测器,其具有各种尺寸的纳米金字塔,采用完全CMOS兼容工艺生产。我们发现肖特基势垒高度为0.59 eV,同时保持较低的暗电流密度(在293 K时低于1 a \cdot m^{-2}$),并且在1300 nm至1600 nm波长范围内,与平面器件相比,我们能够将光学响应性提高7倍以上。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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