Potential of low temperature CMOS with normal and superconductive interconnect

J. Krusius, W. E. Pence
{"title":"Potential of low temperature CMOS with normal and superconductive interconnect","authors":"J. Krusius, W. E. Pence","doi":"10.1109/VMIC.1989.78026","DOIUrl":null,"url":null,"abstract":"The potential of high-T/sub c/ superconductive interconnects in CMOS-based digital systems is examined theoretically using system simulation, a new design tool for electronic packages and systems. A 1.5- mu m-technology CMOS processor, with 500000 circuits partitioned into 25 chips packaged as a single multichip module, is examined. The best implementation with superconductive interconnects at 77 K has a cycle time of 9.6 ns, which is about six times faster than the baseline design with normal metal (Al, Cu) interconnects at 300 K.<<ETX>>","PeriodicalId":302853,"journal":{"name":"Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1989-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VMIC.1989.78026","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

The potential of high-T/sub c/ superconductive interconnects in CMOS-based digital systems is examined theoretically using system simulation, a new design tool for electronic packages and systems. A 1.5- mu m-technology CMOS processor, with 500000 circuits partitioned into 25 chips packaged as a single multichip module, is examined. The best implementation with superconductive interconnects at 77 K has a cycle time of 9.6 ns, which is about six times faster than the baseline design with normal metal (Al, Cu) interconnects at 300 K.<>
常温和超导互连的低温CMOS电位
利用系统仿真这一新的电子封装和系统设计工具,从理论上研究了基于cmos的数字系统中高t /sub /超导互连的潜力。研究了一种1.5 μ m技术的CMOS处理器,该处理器将50万个电路划分为25个芯片,封装为单个多芯片模块。77 K超导互连的最佳实现周期时间为9.6 ns,比300 K的普通金属(Al, Cu)互连的基准设计快约6倍
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