Temperature Dependent Thermal Resistances at GaN-Substrate Interfaces in GaN Composite Substrates

Jungwan Cho, Yiyang Li, D. Altman, W. Hoke, M. Asheghi, K. Goodson
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引用次数: 19

Abstract

We report the temperature dependent thermal properties of two types of GaN composite substrates (GaN-SiC and GaN-Si) using picosecond time-domain thermoreflectance (TDTR). The intrinsic thermal conductivity of the GaN buffer film decreases with increasing temperature, while the GaN-substrate thermal interface resistance (TIR) increases with increasing temperature. The strong temperature dependence of the GaN-substrate TIR suggests that microstructural defects within the AlN transition film and near its boundaries can be particularly important.
GaN复合衬底中GaN-衬底界面的温度相关热阻
我们使用皮秒时域热反射(TDTR)报告了两种GaN复合衬底(GaN- sic和GaN- si)的温度相关热性能。GaN缓冲膜的固有导热系数随温度升高而减小,而GaN-衬底热界面电阻(TIR)随温度升高而增大。gan衬底TIR的强烈温度依赖性表明,AlN过渡膜内及其边界附近的微结构缺陷可能特别重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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