Large Coercive Field in Hf0.5Zr0.5O2-based Capacitors with Gd Top Electrode

Xiaoyue Zhao, M. Shao, Houfang Liu, R. Zhao, Xichen Sun, Xiao Liu, Xiaoming Wu, Yi Yang, T. Ren
{"title":"Large Coercive Field in Hf0.5Zr0.5O2-based Capacitors with Gd Top Electrode","authors":"Xiaoyue Zhao, M. Shao, Houfang Liu, R. Zhao, Xichen Sun, Xiao Liu, Xiaoming Wu, Yi Yang, T. Ren","doi":"10.1109/ASICON52560.2021.9620386","DOIUrl":null,"url":null,"abstract":"Gd top electrode was applied in the Hf<inf>0.5</inf>Zr<inf>0.5</inf>O<inf>2</inf> (HZO)-based capacitors via re-capping technique and its ferroelectric characteristics were investigated. A recorded-highest positive coercive field value of ~3.02 MV/cm was demonstrated with a P<inf>r</inf> value near 11.1 μC/cm<sup>2</sup>. The asymmetric switching dynamics of the Pt/Gd/HZO/TiN capacitor were studied to confirm the origin of the large E<inf>c</inf>. This work will contribute to the future applications of Gd electrodes in ferroelectric memory transistors.","PeriodicalId":233584,"journal":{"name":"2021 IEEE 14th International Conference on ASIC (ASICON)","volume":"41 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-10-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE 14th International Conference on ASIC (ASICON)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASICON52560.2021.9620386","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Gd top electrode was applied in the Hf0.5Zr0.5O2 (HZO)-based capacitors via re-capping technique and its ferroelectric characteristics were investigated. A recorded-highest positive coercive field value of ~3.02 MV/cm was demonstrated with a Pr value near 11.1 μC/cm2. The asymmetric switching dynamics of the Pt/Gd/HZO/TiN capacitor were studied to confirm the origin of the large Ec. This work will contribute to the future applications of Gd electrodes in ferroelectric memory transistors.
Gd顶电极hf0.5 zr0.5 o2电容器的大矫顽场研究
采用复盖技术将Gd顶电极应用于Hf0.5Zr0.5O2 (HZO)基电容器中,研究了其铁电特性。记录最高的正矫顽力场值为~3.02 MV/cm, Pr值接近11.1 μC/cm2。研究了Pt/Gd/HZO/TiN电容器的非对称开关动力学,以确定大Ec的来源。这项工作将有助于Gd电极在铁电存储器晶体管中的应用。
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