Automated analysis of MOS-C relaxation time for WLR testing

D. Monroe, S. Swanson
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Abstract

Summary form only given. The relaxation time of a metal oxide semiconductor capacitor (MOS-C) is the time required for the restoration of thermal equilibrium, after being pulsed into deep depletion. Relaxation time has become widely used for monitoring wafer processing, because it is sensitive to the presence of contaminants. This paper describes and compares two automated techniques for analysis of capacitor relaxation-time data to determine the mean generation lifetime, /spl tau//sub g/, for electron-hole pairs. The first technique is an enhanced version of an existing method, while the second is a new technique that requires much less data processing and is much more reliable as an automated analysis tool.
用于WLR测试的MOS-C松弛时间的自动分析
只提供摘要形式。金属氧化物半导体电容器(MOS-C)的弛豫时间是脉冲进入深度耗尽后恢复热平衡所需的时间。由于松弛时间对污染物的存在很敏感,它已被广泛用于监测晶圆加工。本文描述并比较了两种用于分析电容器弛豫时间数据的自动化技术,以确定电子-空穴对的平均生成寿命/spl tau//sub g/。第一种技术是现有方法的增强版,而第二种技术是一种新技术,需要更少的数据处理,并且作为自动化分析工具更加可靠。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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