Value of EUV lithography for DRAM manufacturing

Chang-moon Lim
{"title":"Value of EUV lithography for DRAM manufacturing","authors":"Chang-moon Lim","doi":"10.1117/12.2605763","DOIUrl":null,"url":null,"abstract":"It seems like EUV is at the center stage of semiconductor industry nowadays. Several leading companies has already established manufacturing foothold on EUV and add the number of equipment steadily where double-digit number of tools are already operational in their realm. Mostly logic and foundry sectors have moved earlier for EUV high volume manufacturing but memory makers are also following suit. In the presentation, it will be reviewed what specific aspects has differentiated the memory sector from logic and foundry in view of EUV adoption. The value of EUV lithography by comparing that of ArF immersion based multiple patterning techniques will be examined. It will be also touched on the current status and future extendibility of EUV lithography in view of DRAM manufacturing will be briefly addressed also.","PeriodicalId":169926,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2021","volume":"71 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Extreme Ultraviolet Lithography 2021","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2605763","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

It seems like EUV is at the center stage of semiconductor industry nowadays. Several leading companies has already established manufacturing foothold on EUV and add the number of equipment steadily where double-digit number of tools are already operational in their realm. Mostly logic and foundry sectors have moved earlier for EUV high volume manufacturing but memory makers are also following suit. In the presentation, it will be reviewed what specific aspects has differentiated the memory sector from logic and foundry in view of EUV adoption. The value of EUV lithography by comparing that of ArF immersion based multiple patterning techniques will be examined. It will be also touched on the current status and future extendibility of EUV lithography in view of DRAM manufacturing will be briefly addressed also.
EUV光刻技术在DRAM制造中的价值
目前,极紫外似乎是半导体产业的中心舞台。几家领先的公司已经在EUV领域建立了制造立足点,并稳步增加设备数量,其中两位数的工具已经在其领域中运行。大多数逻辑和代工行业较早开始了EUV大批量生产,但内存制造商也紧随其后。在本次演讲中,我们将回顾在EUV应用方面,内存行业与逻辑和代工行业的具体区别。通过比较基于ArF浸没的多图片化技术,将检验EUV光刻的价值。本文还将简要介绍EUV光刻技术在DRAM制造中的现状和未来的可扩展性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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