Revisiting mechanisms of molecular contamination induced laser optic damage

J. Canham
{"title":"Revisiting mechanisms of molecular contamination induced laser optic damage","authors":"J. Canham","doi":"10.1117/12.753588","DOIUrl":null,"url":null,"abstract":"A revision of a theoretical mechanism proposed last year based upon the known chemical and physical interactions of laser radiation, fused silica, aromatic molecules and environmental factors will be presented, as relates to other proposed mechanisms. This paper specifically addresses the interaction of toluene with 1064nm laser radiation as related to the formation of benzyl radical, and to free radical photochemistry of toluene. This will address specifically, the effects of oxygen and water in the system, the effects of hydroxyl radical in the system, the interpretation of the XPS spectra of laser damaged silica in the presence and absence of aromatic hydrocarbons and the relationship of these points to the photochemistry of silica.","PeriodicalId":204978,"journal":{"name":"SPIE Laser Damage","volume":"124 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE Laser Damage","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.753588","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

A revision of a theoretical mechanism proposed last year based upon the known chemical and physical interactions of laser radiation, fused silica, aromatic molecules and environmental factors will be presented, as relates to other proposed mechanisms. This paper specifically addresses the interaction of toluene with 1064nm laser radiation as related to the formation of benzyl radical, and to free radical photochemistry of toluene. This will address specifically, the effects of oxygen and water in the system, the effects of hydroxyl radical in the system, the interpretation of the XPS spectra of laser damaged silica in the presence and absence of aromatic hydrocarbons and the relationship of these points to the photochemistry of silica.
分子污染诱导激光光学损伤的机理研究
去年提出的一种理论机制的修订将基于已知的激光辐射、熔融二氧化硅、芳香分子和环境因素的化学和物理相互作用,并与其他提出的机制有关。本文重点研究了甲苯与1064nm激光辐射的相互作用与苯自由基形成的关系,以及甲苯的自由基光化学反应。这将具体讨论,系统中氧和水的影响,系统中羟基自由基的影响,在存在和不存在芳香烃的情况下激光损伤二氧化硅的XPS光谱的解释以及这些点与二氧化硅光化学的关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信