Influence of electric field distribution on laser induced damage threshold and morphology of high reflectance optical coatings

G. Abromavičius, R. Buzelis, R. Drazdys, A. Melninkaitis, V. Sirutkaitis
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引用次数: 39

Abstract

Various investigations show that damage threshold of optical coatings by intense ultrashort laser pulses is closely related to the intensity of electric field at layer interfaces. LIDT measurements of high reflectance optical coatings using femtosecond pulses at 800 nm wavelength are presented. ZrO2, HfO2 and Ta2O5 as high refractive index materials for two sets of experiments were chosen. Two different coating designs were investigated: standard quarter-wavelength design with SiO2 overcoat and modified "E-field" non quarter-wavelength design with suppressed electric field. Damage sites were studied using optical and AFM microscopes. Relation between electric field distribution and damage morphology was observed. The results demonstrate, that suppressing electric field at layer interfaces enables to increase LIDT for high reflectance coatings almost twice if compared to standard quarter-wavelength design when using ultrashort laser pulses. However electric field distribution is sensitive to variations in thicknesses of outer layers, so deposition process should be precisely controlled to get improvement in LIDT of coatings.
电场分布对高反射率光学涂层激光损伤阈值及形貌的影响
各种研究表明,强超短激光脉冲对光学涂层的损伤阈值与层界面处电场强度密切相关。本文介绍了利用飞秒脉冲在800nm波长下对高反射率光学涂层进行LIDT测量的方法。选择ZrO2、HfO2和Ta2O5作为高折射率材料进行两组实验。研究了两种不同的涂层设计:标准四分之一波长SiO2涂层设计和抑制电场的改良“e场”非四分之一波长涂层设计。利用光学显微镜和原子力显微镜对损伤部位进行了研究。观察电场分布与损伤形貌的关系。结果表明,当使用超短激光脉冲时,抑制层界面处的电场可以使高反射率涂层的LIDT增加几乎是标准四分之一波长设计的两倍。但电场分布对镀层厚度的变化很敏感,因此需要对镀层的沉积过程进行精确控制,以提高镀层的LIDT。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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