{"title":"Extracting of substrate network resistances in RF CMOS transistors","authors":"M. M. Tabrizi, E. Fathi, M. Fathipour, N. Masoumi","doi":"10.1109/SMIC.2004.1398207","DOIUrl":null,"url":null,"abstract":"Substrate network resistances are analyzed and extracted for multi-finger MOS transistors used in RF applications. The commonly used model for MOS transistors in RF applications mainly consists of a substrate resistance network having three resistors. A typical horse-shoe CMOS transistor is laid out and all substrate resistances are extracted from I-V characteristics. Device and process simulation results for 0.25 /spl mu/m CMOS technology show that the horse-shoe structure decreases the parasitic substrate resistance by 27%. Additionally, we show that the results obtained by the traditional approximation method deviated about 31% from the exact results. Furthermore, with the proposed method, the substrate resistance values can be exactly extracted.","PeriodicalId":288561,"journal":{"name":"Digest of Papers. 2004 Topical Meeting onSilicon Monolithic Integrated Circuits in RF Systems, 2004.","volume":"63 2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers. 2004 Topical Meeting onSilicon Monolithic Integrated Circuits in RF Systems, 2004.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMIC.2004.1398207","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
Substrate network resistances are analyzed and extracted for multi-finger MOS transistors used in RF applications. The commonly used model for MOS transistors in RF applications mainly consists of a substrate resistance network having three resistors. A typical horse-shoe CMOS transistor is laid out and all substrate resistances are extracted from I-V characteristics. Device and process simulation results for 0.25 /spl mu/m CMOS technology show that the horse-shoe structure decreases the parasitic substrate resistance by 27%. Additionally, we show that the results obtained by the traditional approximation method deviated about 31% from the exact results. Furthermore, with the proposed method, the substrate resistance values can be exactly extracted.