Chip-level modeling and analysis of electrical masking of soft errors

Abstract

With continuous downscaling of VLSI technologies, logic cells are becoming more susceptible to radiation-induced soft error. To accurately model this at chip-level, the impact of electrical masking should be accurately considered. Moreover, increasing complexity of VLSI chips at nanoscale results in voltage fluctuation across the chip which impacts the electrical masking. In this paper, we present a chip-level electrical masking analysis which accurately considers the impact of voltage fluctuation across the chip. Our analysis shows that neglecting voltage fluctuation in electrical masking can lead up to 152% inaccuracy in the overall soft error rate. We also present a technique based on backward pulse propagation to reduce the runtime of this analysis.