Thermal control system based on thin film heaters and amorphous silicon diodes

N. Lovecchio, G. Petrucci, D. Caputo, S. Alameddine, M. Carpentiero, L. Martini, E. Parisi, G. Cesare, A. Nascetti
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引用次数: 13

Abstract

In this paper we present a system able to perform thermal treatments on lab-on-chip devices fabricated on glass substrates. The system includes a thin film resistor acting as heater and thin film hydrogenated amorphous silicon diodes acting as temperature sensors. An electronic system controls the lab-on-chip temperature through a Proportional-IntegralDerivative algorithm. In particular, an electronic board infers the system temperature measuring the voltage across the amorphous silicon diodes and drives the heater to achieve the set-point temperature. Taking into account the 16-bit ADC resolution and the sensors sensitivity, which is around 3.6 mV/oC, we estimate that our system is able to detect temperature variation as low as 3.5·10-3oC. Furthermore, the experimental results show that the system is able to stabilize the system temperature with a precision better than 0.1 oC.
基于薄膜加热器和非晶硅二极管的热控制系统
在本文中,我们提出了一个系统,能够执行热处理实验室芯片器件制造在玻璃基板上。该系统包括作为加热器的薄膜电阻器和作为温度传感器的薄膜氢化非晶硅二极管。电子系统通过比例-积分-导数算法控制芯片上实验室的温度。特别是,电子板通过测量非晶硅二极管上的电压推断系统温度,并驱动加热器以达到设定点温度。考虑到16位ADC分辨率和传感器灵敏度(约3.6 mV/oC),我们估计我们的系统能够检测低至3.5·10-3oC的温度变化。此外,实验结果表明,该系统能够稳定系统温度,精度优于0.1℃。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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