A 40nm 0.35V 25MHz Half-Select Disturb-Free Bitinterleaving 10T SRAM With Data-Aware Write-Path

Yifei Li, Jian Chen, Yuqi Wang, Zihan Yin, Hongyu Chen, Y. Ha
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Abstract

With the widespread applications of wireless sensors, implantable biomedical devices, and small handheld devices, the demand for ultra-low voltage SRAM is growing. However, the probability of soft errors at low voltages is also increasing, and using a bit-interleaving structure is essential for ultra-low voltage SRAM to mitigate soft errors efficiently. Nevertheless, the write half-select disturb, which results in unstable operation in the bit-interleaving structure, poses critical challenges to achieve faster writes at ultra-low voltages [1] –[5].
具有数据感知写入路径的40nm 0.35V 25MHz半选择无干扰位交错10T SRAM
随着无线传感器、植入式生物医学设备和小型手持设备的广泛应用,对超低电压SRAM的需求日益增长。然而,在低电压下软错误的概率也在增加,使用位交错结构是超低电压SRAM有效减轻软错误的必要条件。然而,写入半选择干扰会导致比特交错结构的不稳定运行,这对在超低电压[1]-[5]下实现更快的写入提出了关键挑战。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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