Thermal Characteristics of ESD Diode in FDSOI Technologies

Zhaonian Yang, N. Yu, J. Liou
{"title":"Thermal Characteristics of ESD Diode in FDSOI Technologies","authors":"Zhaonian Yang, N. Yu, J. Liou","doi":"10.1109/EDSSC.2018.8487095","DOIUrl":null,"url":null,"abstract":"Electrostatic discharge (ESD) protection is very important for integrated circuits. In the fully depleted silicon on insulator (FDSOI) technology, the buried oxide (BOX) caused thermal degradation is one of the factors that degrade the intrinsic ESD robustness. In this work, the thermal characteristic of FDSOI ESD diode is investigated by TCAD simulations. The results show that the reduction in BOX thickness and material optimization can improve the heat dissipation and device’s ESD performance.","PeriodicalId":279745,"journal":{"name":"2018 IEEE International Conference on Electron Devices and Solid State Circuits (EDSSC)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Conference on Electron Devices and Solid State Circuits (EDSSC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDSSC.2018.8487095","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Electrostatic discharge (ESD) protection is very important for integrated circuits. In the fully depleted silicon on insulator (FDSOI) technology, the buried oxide (BOX) caused thermal degradation is one of the factors that degrade the intrinsic ESD robustness. In this work, the thermal characteristic of FDSOI ESD diode is investigated by TCAD simulations. The results show that the reduction in BOX thickness and material optimization can improve the heat dissipation and device’s ESD performance.
FDSOI技术中ESD二极管的热特性
静电放电(ESD)保护对于集成电路来说是非常重要的。在完全耗尽绝缘体上硅(FDSOI)技术中,埋藏氧化物(BOX)引起的热降解是降低固有ESD稳健性的因素之一。本文通过TCAD仿真研究了FDSOI型ESD二极管的热特性。结果表明,减小BOX厚度和优化材料可以改善器件的散热和ESD性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信