Performance Improvement of Solution-Processed Organic Floating-Gate Transistor Memories via Tuning the Work Function of Gate Electrodes

Naoyuki Nishida, Shion Tazuhara, Reitato Hattori, Miho Higashinakaya, T. Nagase, Takashi Kobayashi, H. Naito
{"title":"Performance Improvement of Solution-Processed Organic Floating-Gate Transistor Memories via Tuning the Work Function of Gate Electrodes","authors":"Naoyuki Nishida, Shion Tazuhara, Reitato Hattori, Miho Higashinakaya, T. Nagase, Takashi Kobayashi, H. Naito","doi":"10.23919/AM-FPD52126.2021.9499172","DOIUrl":null,"url":null,"abstract":"Top-gate/bottom-contact organic floating-gate transistor memories have been fabricated by solution processes using an ambipolar polymer semiconductor and an organic composite film composed of polymer insulator and soluble pentacene derivative. The solution-processed memory devices with electron injection layers exhibit good n-type transistor behavior and memory characteristics by storing of holes in the organic composite charge storage layer after programming in the dark. It is found that tuning the work function of gate electrodes using the metal oxide layer of Cs2CO3 improves charge retention characteristics.","PeriodicalId":215213,"journal":{"name":"2021 28th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-06-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 28th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/AM-FPD52126.2021.9499172","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Top-gate/bottom-contact organic floating-gate transistor memories have been fabricated by solution processes using an ambipolar polymer semiconductor and an organic composite film composed of polymer insulator and soluble pentacene derivative. The solution-processed memory devices with electron injection layers exhibit good n-type transistor behavior and memory characteristics by storing of holes in the organic composite charge storage layer after programming in the dark. It is found that tuning the work function of gate electrodes using the metal oxide layer of Cs2CO3 improves charge retention characteristics.
通过调节栅电极的功函数来改善溶液处理有机浮栅晶体管存储器的性能
采用双极性聚合物半导体和由聚合物绝缘体和可溶的并五苯衍生物组成的有机复合薄膜,采用溶液法制备了顶栅/底触有机浮栅晶体管存储器。具有电子注入层的溶液处理存储器件通过在黑暗中编程后将空穴存储在有机复合电荷存储层中,表现出良好的n型晶体管性能和存储特性。研究发现,利用Cs2CO3金属氧化层调整栅极的功函数可以改善电荷保留特性。
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