Naoyuki Nishida, Shion Tazuhara, Reitato Hattori, Miho Higashinakaya, T. Nagase, Takashi Kobayashi, H. Naito
{"title":"Performance Improvement of Solution-Processed Organic Floating-Gate Transistor Memories via Tuning the Work Function of Gate Electrodes","authors":"Naoyuki Nishida, Shion Tazuhara, Reitato Hattori, Miho Higashinakaya, T. Nagase, Takashi Kobayashi, H. Naito","doi":"10.23919/AM-FPD52126.2021.9499172","DOIUrl":null,"url":null,"abstract":"Top-gate/bottom-contact organic floating-gate transistor memories have been fabricated by solution processes using an ambipolar polymer semiconductor and an organic composite film composed of polymer insulator and soluble pentacene derivative. The solution-processed memory devices with electron injection layers exhibit good n-type transistor behavior and memory characteristics by storing of holes in the organic composite charge storage layer after programming in the dark. It is found that tuning the work function of gate electrodes using the metal oxide layer of Cs2CO3 improves charge retention characteristics.","PeriodicalId":215213,"journal":{"name":"2021 28th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-06-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 28th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/AM-FPD52126.2021.9499172","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Top-gate/bottom-contact organic floating-gate transistor memories have been fabricated by solution processes using an ambipolar polymer semiconductor and an organic composite film composed of polymer insulator and soluble pentacene derivative. The solution-processed memory devices with electron injection layers exhibit good n-type transistor behavior and memory characteristics by storing of holes in the organic composite charge storage layer after programming in the dark. It is found that tuning the work function of gate electrodes using the metal oxide layer of Cs2CO3 improves charge retention characteristics.