Floating island and thick bottom oxide trench gate MOSFET (FITMOS) - a 60V ultra low on-resistance novel MOSFET with superior internal body diode

H. Takaya, K. Miyagi, K. Hamada, Y. Okura, N. Tokura, A. Kuroyanagi
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引用次数: 13

Abstract

A MOSFET structure named FITMOS has been successfully developed that exhibits record-low loss in the 60 volts breakdown voltage range. The breakdown voltage of 64 volts and specific on-resistance of 22m/spl Omega/mm/sup 2/ (V/sub gs/=15V) this performance exceeds the unipolar limit (Chenming Hu, 1979). The device has a body diode with superior reverse recovery characteristics and exhibits an extremely small value for RonQgd. The distinctive feature of this device is the use of floating islands formed by self-alignment and trench gates with a thick oxide layer on the bottoms. This structure can also be used for the terminal portion of the device, so the increase in the number of fabrication processes is less than 5%. Moreover, the rate of nondefective gates in 3-by-4-mm rectangular devices on an 8-inch wafer is at least 98%.
浮岛和厚底氧化沟槽栅极MOSFET (FITMOS) -一种60V超低导通电阻的新型MOSFET,具有卓越的内部二极管
一种名为FITMOS的MOSFET结构已经成功开发,在60伏击穿电压范围内具有创纪录的低损耗。击穿电压为64伏,比导通电阻为22m/spl ω /mm/sup 2/ (V/sub gs/=15V),这一性能超过了单极极限(胡辰明,1979)。该器件具有具有优异反向恢复特性的主体二极管,并且显示出极小的RonQgd值。该装置的显著特点是使用了由自对准和底部有厚氧化层的沟槽门形成的浮动岛。该结构也可用于器件的终端部分,因此制造工艺数量的增加小于5%。此外,在8英寸晶圆上的3 × 4毫米矩形器件中,无缺陷栅极的比率至少为98%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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