M. Sozet, J. Néauport, E. Lavastre, N. Roquin, L. Gallais, L. Lamaignère
{"title":"Laser damage resistance of optical components in sub-picosecond regime in the infrared","authors":"M. Sozet, J. Néauport, E. Lavastre, N. Roquin, L. Gallais, L. Lamaignère","doi":"10.1117/12.2194286","DOIUrl":null,"url":null,"abstract":"A rasterscan procedure is set to determine laser-induced damage densities in sub-picosecond regime at 1053nm on high-reflective coatings. Whereas laser-induced damage is usually considered deterministic in this regime, damage events occur on these structures for fluences lower than their intrinsic Laser-Induced Damage Threshold (LIDT). Damage densities are found to be high even for fluences as low as 20% of the LIDT. Scanning Electron Microscope observations of these “under threshold” damage sites evidence ejections of defects, embedded in the dielectric stack. It brings a new viewpoint for the qualification of optical components and for the optimization of manufacturing processes of coatings.","PeriodicalId":204978,"journal":{"name":"SPIE Laser Damage","volume":"9 1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE Laser Damage","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2194286","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A rasterscan procedure is set to determine laser-induced damage densities in sub-picosecond regime at 1053nm on high-reflective coatings. Whereas laser-induced damage is usually considered deterministic in this regime, damage events occur on these structures for fluences lower than their intrinsic Laser-Induced Damage Threshold (LIDT). Damage densities are found to be high even for fluences as low as 20% of the LIDT. Scanning Electron Microscope observations of these “under threshold” damage sites evidence ejections of defects, embedded in the dielectric stack. It brings a new viewpoint for the qualification of optical components and for the optimization of manufacturing processes of coatings.