Ge and GaAs integration for device applications

C. Chia, Aneesa Iskander, Yuanbing Cheng, Jin Yunjiang, G. Dalapati, Terry Zhuo Qiuwei
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Abstract

We have investigated the integration of Ge and GaAs, for both GaAs epilayer grown on Ge substrate, and Ge epilayer grown on GaAs substrate. The materials characteristics were studied and several technical issues were addressed. An example of device application for these material system has been presented, which shows excellent results that have combined benefits from both Ge and GaAs.
用于器件应用的Ge和GaAs集成
我们研究了在Ge衬底上生长的GaAs薄膜和在GaAs衬底上生长的Ge薄膜的集成。对材料特性进行了研究,并提出了若干技术问题。最后给出了该材料体系在器件上的应用实例,结果表明该材料体系具有良好的综合效益。
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