Compensation of the Warpage of CVD Diamond Wafers using Intermediate Layers for Surface Activated Bonding

Junsha Wang, T. Suga
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Abstract

4 inch polycrystalline CVD diamond wafers were bonded to single crystalline oxide wafers by modified surface activated bonding (SAB). To compensate the warpage of diamond wafers, SiO2 was deposited on diamond surface and used as intermediate layers for bonding. Results shows that the warpage and shape of SiO2/diamond wafers influenced the bonded area greatly. For the convex shaped wafer, when the Peak-to-valley (Pv) value was smaller than 4 um, at least 50% of the surface could be bonded; while the Pv exceeded 7 um, the bonding failed. Compared with the saddle shape, convex shaped wafers tended to be bonded easily. Finally, 85% bonded area was achieved. SEM and STEM images demonstrates that the interface was uniformly bonded without any nano-voids.
利用中间层表面活化键合补偿CVD金刚石片的翘曲
采用改性表面活化键合(SAB)技术将4英寸多晶CVD金刚石晶片与单晶氧化物晶片结合。为了补偿金刚石片的翘曲,在金刚石表面沉积二氧化硅作为粘合中间层。结果表明,SiO2/金刚石晶圆的翘曲度和形状对结合面积有较大影响。对于凸形晶圆,当峰谷比(Pv)值小于4 um时,至少有50%的表面可以被键合;当Pv大于7um时,粘结失败。与鞍形晶圆相比,凸形晶圆更容易粘接。最终达到85%的保税区。SEM和STEM图像表明,界面结合均匀,无纳米空洞。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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