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The Influence Of Preoxidation Cleaning Chemistry And Wafer Substrate On Thin Gate Oxide Defect Density

International Report on Wafer Level Reliability Workshop Pub Date : 1900-01-01 DOI:10.1109/IWLR.1992.657990
B. Triplett, M. Tran, M. Aminzadeh
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预氧化清洗化学和晶圆衬底对薄栅氧化缺陷密度的影响
本文章由计算机程序翻译，如有差异，请以英文原文为准。
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International Report on Wafer Level Reliability Workshop
International Report on Wafer Level Reliability Workshop
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