{"title":"Simulation of Influence of AlGaN/GaN Heterojunction Parameters on Its Capacitance Curves","authors":"J. Osvald","doi":"10.1109/ASDAM.2008.4743348","DOIUrl":null,"url":null,"abstract":"We used the solution of the Poisson equation together with the drift and diffusion equations to simulate precisely the voltage dependence of the AlGaN/GaN capacitor structure. We demonstrate the influence of the structure parameters like doping concentrations of AlGaN, Schottky barrier height, and the thickness of the AlGaN layer on resulting C-V curve of the heterojunction capacitor. Also the capacitance of the structure in forward bias was simulated and the capacitance peak that sometimes occurs in the measurements was identified.","PeriodicalId":306699,"journal":{"name":"2008 International Conference on Advanced Semiconductor Devices and Microsystems","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 International Conference on Advanced Semiconductor Devices and Microsystems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASDAM.2008.4743348","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
We used the solution of the Poisson equation together with the drift and diffusion equations to simulate precisely the voltage dependence of the AlGaN/GaN capacitor structure. We demonstrate the influence of the structure parameters like doping concentrations of AlGaN, Schottky barrier height, and the thickness of the AlGaN layer on resulting C-V curve of the heterojunction capacitor. Also the capacitance of the structure in forward bias was simulated and the capacitance peak that sometimes occurs in the measurements was identified.