Comparative performance, leakage power and switching power of circuits in 150 nm PD-SOI and bulk technologies including impact of SOI history effect

S. Narendra, J. Tschanz, A. Keshavarzi, S. Borkar, V. De
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引用次数: 12

Abstract

History effect measurements on different circuits in a 150 nm SOI technology show no adverse impact on worst-case delay vs. leakage trade-offs. The performance advantage of SOI over bulk is shown to come mostly from capacitance reduction. Hence, it will diminish with technology scaling.
比较150nm PD-SOI和块体工艺电路的性能、漏功率和开关功率,包括SOI历史效应的影响
在150nm SOI技术中对不同电路的历史效应测量显示,对最坏情况下的延迟和泄漏权衡没有不利影响。SOI的性能优势主要来自于电容的减小。因此,它将随着技术的扩展而减少。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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