S. Narendra, J. Tschanz, A. Keshavarzi, S. Borkar, V. De
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引用次数: 12
Abstract
History effect measurements on different circuits in a 150 nm SOI technology show no adverse impact on worst-case delay vs. leakage trade-offs. The performance advantage of SOI over bulk is shown to come mostly from capacitance reduction. Hence, it will diminish with technology scaling.