Resisitive switching variability study on 1T1R AlOx/WOx-based RRAM array

Abstract

Resistive random access memories (RRAM) often show large variation due to the stochastic nature of the switching process. Bilayer AlOx/WOx based RRAM cells were investigated for key parameters variations. Those AlOx/WOx memory devices were fabricated in a commercial CMOS foundry. Yield of forming process is studied with different transistor size and forming voltage. The tradeoff between array size, speed and power consumption are discussed.