Susceptibility of PMOS Transistors under High RF Excitations at Source Pin

Ognjen Jović, U. Stuermer, W. Wilkening, C. Maier, A. Barić
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引用次数: 5

Abstract

This work analyses the operation point shift of PMOS transistors at high electromagnetic interference levels. These devices are typically connected to supply rails of integrated circuits. In this configuration their source connections are subjected to RF disturbances. We provide measurement and simulation results of such interferences and their effects. The results reveal a complex behaviour at low frequencies when the power level is varied. This behaviour is caused by both non-linear characteristics of the intrinsic PMOS transistor and the turn-on of the parasitic drain-bulk diode at higher power levels. It is relevant up to RF frequencies of several hundred MHz.
源引脚高射频激励下PMOS晶体管的磁化率
本文分析了高电磁干扰水平下PMOS晶体管的工作点位移。这些设备通常连接到集成电路的供电轨道上。在这种配置中,它们的源连接受到射频干扰。我们提供了这些干扰及其影响的测量和模拟结果。结果表明,当功率电平变化时,在低频下的复杂行为。这种行为是由固有PMOS晶体管的非线性特性和寄生漏极体二极管在较高功率水平下的导通引起的。它与几百兆赫的射频频率相关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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