Design Optimization of GaAs/AlGaAs Lasers Epitaxially Grown on Si Substrates with Threading Dislocation Density in the Range of ~106cm−2

Yugeng Shi, Bing Wang, Siyuan Yu
{"title":"Design Optimization of GaAs/AlGaAs Lasers Epitaxially Grown on Si Substrates with Threading Dislocation Density in the Range of ~106cm−2","authors":"Yugeng Shi, Bing Wang, Siyuan Yu","doi":"10.1109/CSTIC52283.2021.9461434","DOIUrl":null,"url":null,"abstract":"We have studied the total number effect of TDs in laser cavities with different sizes by using the rate equations in theory and simulation. Our initial results show that by decreasing the laser cavity size, the threshold current densities can be reduced and other performance such as slope efficiency and nonradiative recombination can be improved. This method may provide another design space for lasers epitaxially grown on Si.","PeriodicalId":186529,"journal":{"name":"2021 China Semiconductor Technology International Conference (CSTIC)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-03-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 China Semiconductor Technology International Conference (CSTIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSTIC52283.2021.9461434","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

We have studied the total number effect of TDs in laser cavities with different sizes by using the rate equations in theory and simulation. Our initial results show that by decreasing the laser cavity size, the threshold current densities can be reduced and other performance such as slope efficiency and nonradiative recombination can be improved. This method may provide another design space for lasers epitaxially grown on Si.
在~106cm−2的Si衬底上外延生长GaAs/AlGaAs激光器的设计优化
本文从理论和仿真两方面研究了不同尺寸激光腔中TDs的总数效应。我们的初步结果表明,通过减小激光腔的尺寸,可以降低阈值电流密度,提高斜率效率和非辐射复合等其他性能。这种方法可能为在硅上外延生长的激光器提供另一种设计空间。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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