Selective Growth of Diamond in Thermal Vias for GaN HEMTs

B. Poust, V. Gambin, R. Sandhu, I. Smorchkova, G. Lewis, R. Elmadjian, Danny Li, C. Geiger, B. Heying, M. Wojtowicz, A. Oki, B. Pate, T. Feygelson, K. Hobart
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引用次数: 15

Abstract

GaN on SiC technology has offered tremendous benefits over existing GaAs-based RF technologies. The high breakdown voltage and current handling capability of GaN HEMTs enable a 10x increase in RF power over conventional GaAs- based devices for the same device size. These benefits translate to dramatically improved performance for military and commercial communications, radar and high-power RF systems. However, despite the high thermal conductivity materials and optimized epitaxial profiles already being used, additional improvement of MMIC performance is limited by thermal constraints. Substrate and near channel thermal resistance is a key thermal bottleneck limiting device compaction and junction temperature reduction. NGAS will report on revolutionary methods being developed to directly integrate high quality, high thermal conductivity diamond materials with more than 4x greater thermal conductivity over existing state-of-the-art GaN on SiC HEMT technology. Reducing temperature in the device channel and surrounding regions is critical for reliable operation, supporting additional device compaction and improving circuit performance.
GaN hemt热孔中金刚石的选择性生长
GaN on SiC技术比现有的基于gaas的射频技术提供了巨大的优势。GaN hemt的高击穿电压和电流处理能力使其在相同器件尺寸下的射频功率比传统的基于GaAs的器件提高了10倍。这些优势转化为军事和商业通信,雷达和大功率射频系统的性能显著提高。然而,尽管已经使用了高导热材料和优化的外延轮廓,但MMIC性能的进一步改进受到热约束的限制。衬底和近通道热阻是限制器件压实和结温降低的关键热瓶颈。NGAS将报告正在开发的革命性方法,直接集成高质量,高导热金刚石材料,其导热系数比现有最先进的GaN on SiC HEMT技术高4倍以上。降低器件通道和周围区域的温度对于可靠运行,支持额外的器件压实和提高电路性能至关重要。
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