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Optical reflectometry-based high-speed temperature change measurement of silicon wafer surfaces

Optical Measurement Systems for Industrial Inspection XIII Pub Date : 2023-08-10 DOI:10.1117/12.2673346
J. Bae, Minji Hyun, Jin-Who Hong, Youngeun Jeon, Sanghyun Son, Y. Seo, Sang-Sun Ha, Jungwon Kim
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基于光学反射法的硅片表面高速温度变化测量
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Optical Measurement Systems for Industrial Inspection XIII
Optical Measurement Systems for Industrial Inspection XIII
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