Reliable Power Delivery System Design for Three-Dimensional Integrated Circuits (3D ICs)

Pei-Wen Luo, Tao Wang, C. Wey, L. Cheng, Bih-Lan Sheu, Yiyu Shi
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引用次数: 5

Abstract

Three-dimensional integrated circuits (3D ICs) have drawn groundswell of interest in both academia and industry in recent years. However, the power integrity of 3D ICs is threatened by the increased current density brought by vertical integration. To enhance reliability, the locations of power/ground through-silicon-vias (P/G TSVs), which are used to deliver power/ground signals to different layers, must be carefully placed to minimize IR-drop. However, the currents in 3D ICs are not deterministic and exhibit both spatial and temporal correlations. In view of this, we propose a correlation based heuristic algorithm for P/G TSV placement. Unlike most existing works, the proposed algorithm does not need iterations of full-grid simulations. Thus, it is especially attractive for large designs with millions of nodes. Experimental results on TSMC 90nm industrial designs indicate that the proposed method can achieve up to 70% reduction in IR-drop compared with the current industry practice, which uniformly distributes P/G TSVs.
三维集成电路(3D ic)可靠供电系统设计
近年来,三维集成电路(3D ic)在学术界和工业界引起了广泛的兴趣。然而,垂直集成带来的电流密度的增加对3D集成电路的功率完整性造成了威胁。为了提高可靠性,电源/接地通硅孔(P/G tsv)的位置(用于将电源/接地信号传递到不同的层)必须仔细放置,以尽量减少ir下降。然而,电流在三维集成电路是不确定的,并表现出空间和时间的相关性。鉴于此,我们提出了一种基于相关性的P/G TSV布局启发式算法。与大多数现有工作不同,该算法不需要全网格模拟的迭代。因此,它对具有数百万节点的大型设计特别有吸引力。在台积电90nm工业设计上的实验结果表明,与目前均匀分布P/G tsv的工业实践相比,该方法可将ir降降低70%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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