A 29.2 Mb/mm2 Ultra High Density SRAM Macro using 7nm FinFET Technology with Dual-Edge Driven Wordline/Bitline and Write/Read-Assist Circuit

Yoshisato Yokoyama, Miki Tanaka, Koji Tanaka, M. Morimoto, M. Yabuuchi, Y. Ishii, S. Tanaka
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引用次数: 4

Abstract

A 29.2Mb/mm2 ultra high density SRAM macro has been proposed using 7-nm CMOS FinFET technology. The SRAM macro has only one SRAM cell array despite of the huge array of 512 rows × 512 columns. The circuitry of dual-edge driver for such long wordline and bitline in such huge array are newly proposed. The SRAM macro using proposed circuit was designed, and a test chip was fabricated using 7-nm CMOS FinFET technology. The minimum operation voltage is improved 170 mV by the new circuits.
29.2 Mb/mm2超高密度SRAM宏,采用7nm FinFET技术,双边缘驱动字线/位线和写/读辅助电路
采用7纳米CMOS FinFET技术,提出了一个29.2Mb/mm2的超高密度SRAM宏。尽管有512行× 512列的庞大数组,SRAM宏只有一个SRAM单元数组。本文提出了一种适用于大型阵列中如此长的字线和位线的双边驱动电路。设计了基于该电路的SRAM宏,并采用7nm CMOS FinFET技术制作了测试芯片。新电路将最小工作电压提高到170 mV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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