Yoshisato Yokoyama, Miki Tanaka, Koji Tanaka, M. Morimoto, M. Yabuuchi, Y. Ishii, S. Tanaka
{"title":"A 29.2 Mb/mm2 Ultra High Density SRAM Macro using 7nm FinFET Technology with Dual-Edge Driven Wordline/Bitline and Write/Read-Assist Circuit","authors":"Yoshisato Yokoyama, Miki Tanaka, Koji Tanaka, M. Morimoto, M. Yabuuchi, Y. Ishii, S. Tanaka","doi":"10.1109/vlsicircuits18222.2020.9162985","DOIUrl":null,"url":null,"abstract":"A 29.2Mb/mm2 ultra high density SRAM macro has been proposed using 7-nm CMOS FinFET technology. The SRAM macro has only one SRAM cell array despite of the huge array of 512 rows × 512 columns. The circuitry of dual-edge driver for such long wordline and bitline in such huge array are newly proposed. The SRAM macro using proposed circuit was designed, and a test chip was fabricated using 7-nm CMOS FinFET technology. The minimum operation voltage is improved 170 mV by the new circuits.","PeriodicalId":252787,"journal":{"name":"2020 IEEE Symposium on VLSI Circuits","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE Symposium on VLSI Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/vlsicircuits18222.2020.9162985","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
A 29.2Mb/mm2 ultra high density SRAM macro has been proposed using 7-nm CMOS FinFET technology. The SRAM macro has only one SRAM cell array despite of the huge array of 512 rows × 512 columns. The circuitry of dual-edge driver for such long wordline and bitline in such huge array are newly proposed. The SRAM macro using proposed circuit was designed, and a test chip was fabricated using 7-nm CMOS FinFET technology. The minimum operation voltage is improved 170 mV by the new circuits.