A High-resolution, Wide-range, Radiation-hard Clock Phase-shifter in a 65 nm CMOS Technology

S. Kulis, Dong-xu Yang, Datao Ghong, J. Fonseca, S. Biereigel, J. Ye, P. Moreira
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引用次数: 1

Abstract

The design and characterization results of a high-resolution phase-shifter are presented. The phase-shifter is designed with radiation hardening techniques and fabricated in 65 nm CMOS technology. The phase-shifter circuit can produce several output frequencies (40, 80, 160, 320, 640 or 1280 MHz) with an adjustable phase (48.4 ps resolution). It has been fully characterized displaying INL<0.61 LSB and DNL<0.44 LSB with the power consumption, depending on the output frequency, staying below 8 μW/MHz.
65纳米CMOS技术的高分辨率、宽范围、抗辐射时钟移相器
介绍了一种高分辨率移相器的设计和表征结果。该移相器采用辐射硬化技术设计,采用65nm CMOS工艺制造。移相器电路可以产生几个输出频率(40,80,160,320,640或1280mhz),相位可调(48.4 ps分辨率)。实验结果表明,该器件的INL<0.61 LSB, DNL<0.44 LSB,功耗随输出频率的变化均低于8 μW/MHz。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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