Flash FEOL Edge Defectivity - Ultra Thin CoxSiy Fiber Defectivity Detection, Characterizations, Root Cause Identification and Fixes to Eliminate Failures at Sort Yield

L. Presslev, M. Meyer, D. Sutton, M. Covert, C. Raeder, C. Foster, D. Price
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引用次数: 2

Abstract

Front end of line (FEOL) defect detection of ultra thin, < 0.02 mum diameter, surface CoxSiy fiber killer defects bridging multiple CoSi2 gate features have typically been found to have capture rates of less than 1% for dark field and bright field defect detection tools. The edge die features of flash memory devices were found to be generating ultra thin Si Fiber/Stringer Killer defects that were undercut during a FEOL pre-clean operation, were converted to CoxSiy in the CoSi2 process operations, and subsequently caused electrical shorts to adjacent CoSi2 word lines thus inducing failures at sort yield testing. Using the KLA-Tencortrade voltage contrast detection tool, the eS31trade, and coupled with the uLooptrade methodology, we have demonstrated significantly higher capture rates inline and these improvements of inline detection ability allowed us to find the root cause of these Fiber/Stringer defects and implement permanent fixes for these Killer defects. Three FEOL processes were found to be interacting causing these Fiber/Stringer marginalities: STI CMP edge uniformity, gate photo patterning overlay (OL), and gate plasma etch. To permanently correct the issue, we utilized a silicon nitride film and we eliminated the CoxSFiber/Stringer defects. This paper discusses the inline detection improvements, characterization of FEOL processes contributing to the marginalities, and the process fixes for elimination of the defects that led towards improvement of sort yields
闪光FEOL边缘缺陷-超薄同轴光纤缺陷检测,表征,根本原因识别和修复,以消除故障在分类产量
对于超薄的、< 0.02微米直径的、表面cosiy光纤的致命缺陷,在暗场和明场缺陷检测工具中,通常发现其捕获率低于1%。在FEOL预清洁操作中,发现闪存器件的边缘芯片特征会产生超薄Si Fiber/Stringer Killer缺陷,这些缺陷在CoSi2工艺操作中被削弱,并在CoSi2工艺操作中转化为cosiy,随后导致相邻CoSi2字线发生电短路,从而导致分类良率测试失败。使用KLA-Tencortrade电压对比检测工具eS31trade,再加上uLooptrade方法,我们已经证明了更高的在线捕获率,这些在线检测能力的改进使我们能够找到这些光纤/弦格缺陷的根本原因,并对这些杀手级缺陷实施永久修复。发现三种FEOL过程相互作用导致这些光纤/弦线边缘:STI CMP边缘均匀性,栅极光图案覆盖(OL)和栅极等离子蚀刻。为了永久性地纠正这个问题,我们使用了氮化硅薄膜,并消除了CoxSFiber/Stringer缺陷。本文讨论了内联检测的改进,FEOL过程的特性,有助于边际性,以及消除导致排序良率提高的缺陷的过程修复
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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