Surface reconstructions of InGaAs layers

J. Millunchick, A. Riposan, B. J. Dall, C. Pearson, B. Orr
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引用次数: 3

Abstract

In this paper, we examined the morphology and surface reconstruction of InGa/sub 1-x/As alloy layers during growth and after annealing. Films of different compositions were grown by molecular beam epitaxy on GaAs and InP(001) substrates to thickness less than the critical thickness for 3D islanding or misfit dislocations formation, and examined using in-situ scanning tunneling microscopy.
InGaAs层的表面重建
本文研究了InGa/sub - 1-x/As合金层在生长和退火过程中的形貌和表面重构。通过分子束外延在GaAs和InP(001)衬底上生长不同成分的薄膜,使其厚度小于三维孤岛或错配位错形成的临界厚度,并使用原位扫描隧道显微镜进行检测。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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