Fatigue Crack Growth Behavior in Silicon Nitride under Constant and Variable Amplitude Load Sequences

Atsuhiro Koyama, A. Sugeta, Y. Uematsu, M. Jono
{"title":"Fatigue Crack Growth Behavior in Silicon Nitride under Constant and Variable Amplitude Load Sequences","authors":"Atsuhiro Koyama, A. Sugeta, Y. Uematsu, M. Jono","doi":"10.2472/jsms.49.6Appendix_116","DOIUrl":null,"url":null,"abstract":"In order to investigate cyclic fatigue crack growth behavior of a gas-pressure-sintered silicon nitride under constant and variable amplitude load sequences, fatigue crack growth tests were carried out using compact type (CT) specimens, The crack length and macroscopic crack closure were measured using an unloading elastic compliance method. Grain interlocking was observed around crack wake in all fatigue test conditions, which implied fatigue crack growth of this material was associated with progressive degradation of the grain interlocking by cyclic loading. The fatigue crack growth rate, da/dn, under constant amplitude loading was controlled not only by the maximum stress intensity factor, K max , but also the stress amplitude, while K max was the most important factor in cyclic fatigue crack growth. The overload and high-level load excursion produced the acceleration of fatigue crack growth and the downward shift of crack closure point under low-level loading. This decrease was thought to result from much severer crash or frictional wear of grain interlocking and the crack closure could explain the acceleration behavior qualitatively.","PeriodicalId":377759,"journal":{"name":"Materials Science Research International","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science Research International","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2472/jsms.49.6Appendix_116","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

In order to investigate cyclic fatigue crack growth behavior of a gas-pressure-sintered silicon nitride under constant and variable amplitude load sequences, fatigue crack growth tests were carried out using compact type (CT) specimens, The crack length and macroscopic crack closure were measured using an unloading elastic compliance method. Grain interlocking was observed around crack wake in all fatigue test conditions, which implied fatigue crack growth of this material was associated with progressive degradation of the grain interlocking by cyclic loading. The fatigue crack growth rate, da/dn, under constant amplitude loading was controlled not only by the maximum stress intensity factor, K max , but also the stress amplitude, while K max was the most important factor in cyclic fatigue crack growth. The overload and high-level load excursion produced the acceleration of fatigue crack growth and the downward shift of crack closure point under low-level loading. This decrease was thought to result from much severer crash or frictional wear of grain interlocking and the crack closure could explain the acceleration behavior qualitatively.
恒幅和变幅载荷作用下氮化硅疲劳裂纹扩展行为
为了研究气压烧结氮化硅在恒定和变幅载荷作用下的循环疲劳裂纹扩展行为,采用致密型(CT)试样进行了疲劳裂纹扩展试验,采用卸载弹性柔度法测量了裂纹长度和宏观裂纹闭合性。在所有疲劳试验条件下,裂纹尾迹周围均存在晶粒互锁现象,这表明该材料的疲劳裂纹扩展与循环加载下晶粒互锁的逐步退化有关。恒幅载荷下疲劳裂纹扩展速率da/dn不仅受最大应力强度因子K max的控制,还受应力幅值的控制,其中K max是影响循环疲劳裂纹扩展的最重要因素。在低载荷作用下,超载和高载荷漂移使疲劳裂纹扩展加速,裂纹闭合点下移。这种减少被认为是由于更严重的碰撞或晶粒互锁摩擦磨损造成的,裂纹闭合可以定性地解释加速行为。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信