Variation-tolerant dense TFET memory with low VMIN matching low-voltage TFET logic

D. Morris, U. Avci, I. Young
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引用次数: 19

Abstract

The tunneling FET (TFET) is a leading option for energy efficient computation with peak logic performance/watt greater than CMOS. With variation effects, TFET reaches 2X higher peak efficiency than MOSFET by using supply voltages under 0.4V. Dense TFET SRAM bitcell is proposed with VMIN matching this low logic VDD. Projections of device variation enable a comparison of TFET and MOSFET logic and memory and show greater robustness for TFET circuits. TFET bitcell write-time tracks logic frequency at low voltage. TFET bitcell retention margins are 0.1 V greater than that of the MOSFET. Bitcell performance and VMIN are improved by using TFET's unique asymmetric conduction to reduce write-contention and read-disturb conditions. A novel 7T bitcell with compact layout is proposed for improved low-voltage write.
具有低VMIN匹配低电压TFET逻辑的容差密度TFET存储器
隧道效应场效应管(ttfet)是节能计算的主要选择,其峰值逻辑性能/瓦特高于CMOS。在变化效应下,当电源电压低于0.4V时,TFET的峰值效率比MOSFET高2倍。采用与该低逻辑VDD相匹配的VMIN,提出了密集TFET SRAM位单元。器件变化的投影能够比较TFET和MOSFET的逻辑和存储器,并显示出更强的TFET电路鲁棒性。在低电压下,TFET位元写入时间跟踪逻辑频率。fet的位元保持裕度比MOSFET高0.1 V。利用ttfet独特的非对称传导特性,减少写争用和读干扰,提高了位元性能和VMIN。为了提高低电压写入性能,提出了一种结构紧凑的7T位单元。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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