Hojin Bak, Horyeong Lee, Won‐Jin Kim, Inho Choi, H. Kim, Dongha Kim, Hanseung Lee, Sukman Han, Kyoung-In Lee, Young-Rak Do, Minsu Cho, M. Baek, K. Kim, Wonje Park, Seong-Hun Kang, S. Hong, Hoon-Sang Oh, Changrock Song
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引用次数: 1
Abstract
In this work, novel color filter isolation technology, which adopts air, the lowest refractive index material on the earth, as a major component of an optical grid structure for submicron pixels of a CMOS image sensor, is presented. Metal in a conventional metal grid structure, which has been widely used for mobile CMOS image sensors, was replaced by the air. The image quality improvement was verified through the enhanced optical performance of the air-grid-assisted pixels.
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